Study of an Amorphous Silicon Germanium Films for Use as an Absorber Layer of Bottom Cell in a-Si:H/a-SiGe:H Tandem Solar Cells
Keywords:
Absorber layer,, Hydrogenated amorphous silicon, Hydrogenated amorphous silicon germaniumAbstract
This paper presents the study of the deposition of hydrogenated amorphous silicon germanium (a-SiGe:H) films with the optical bandgap (Eopt) target of 1.5-1.6 eV for use as the bottom-layer of a-Si:H/a-SiGe:H tandem solar cells by using plasma enhance chemical vapor deposition technique (PECVD). The source gases consist of Silane (SiH4), Germane (GeH4) and Hydrogen (H2) on films property were studied. It was found that the Eopt of the films was decreased with increasing the GeH4/(SiH4+GeH4) and SiH4/(SiH4+GeH4) ratio. However, the electrical property of those films was decreased. For the variation of H2/(SiH4+GeH4) ratio, it was found that the Eopt of the films was increased while the electrical property was slightly decreased. The condition of the 1.53 eV a-SiGe:H film was applied to the bottom cell of a-Si:H/a-SiGe:H tandem solar cells. As a result, high efficiency solar cell of 10.8% (Voc1.71 V, FF 0.67, Jsc 9.4 mA/cm2) was successfully achieved.
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