Optical Emission Spectroscopy of Zinc Acetate Vapor Discharge under the Shower Plasma Source

Abstract

In this research, the emission spectra from the shower plasma source were analyzed using the optical emission spectroscopy method. The zinc acetate vapor as a precursor together with helium and argon as carrier gases were discharged using the plasma enhanced-metal organic chemical vapor deposition (PE-MOVCD) technique at the working pressure of 800 Pa. After identifying the emission spectra from He/Zn(CH₃COO)₂ plasma, we found the maximum intensity of Zn I (411.32 nm) that corresponding to the rf power of 30 W and the rf bias of 10 W. This result indicates that the above conditions appropriate for dissociation of zinc atom from Zn(CH₃COO)₂ molecule. While the emission spectra from Ar/Zn(CH₃COO)₂ plasma shows the highest intensity of Zn I (472.21 nm) when using the rf bias of 10 W. The increasing of the rf bias power result to the increasing of Ar I (750.38 nm) emission line. This result indicates that there is higher argon discharge in the plasma after glow region corresponding to higher argon ion bombardment at the substrate during the formation of ZnO film. The ion bombardment arising from plasma-enhanced chemical vapor deposition is an attractive process for film growth due to its lower substrate temperature requirement. Therefore this technique is useful for deposition on thermally unstable materials.