Effects of Ti target current on the crystal structure, morphology and chemical structure of TiC films as deposited by dual-target DC magnetron sputtering technique


  • Attapol Choeysuppaket Department of Physics, Faculty of Science, Burapha University


TiC films, Dual-target DC magnetron sputtering, Ti target current


TiC films were deposited on silicon wafers by dual-target DC magnetron sputtering technique. The effects of Ti target current on the crystal structure, surface morphology and chemical structure of the films were investigated using X-ray diffraction, field-emission scanning electron microscopy and Raman spectroscopy, respectively. The results showed that the TiC films were deposited with the Ti target current increasing from 400 – 600 mA, the surface roughness, grain size and thickness of films increased. As the Ti target current increased, the crystallinity of TiC films increased, the orientation of TiC crystal structure corresponded to (111) and (200) planes. In addition, the Raman spectra revealed that the increasing of Ti target current had also significantly influenced on chemical structure of TiC films.


Download data is not yet available.


[1] I. Zergioti, A. Hatziapostolou, E. Hontzopoulos, A. Zervaki, G.N. Haidemenopoulos, Pyrolytic laser-based chemical vapor deposition of TiC coating, Thin Sol. Film. 271 (1995) 96 – 100.

[2] M. Shimozuma, M. Yoshino, N. Otsuka, H. Date, Y. Sakai, H. Tagashira, Deposition of TiC films by low frequency (50 Hz) plasma CVD using a substrate bias circuit, Int. Symp. Plasma Chem. 3 (1997) 1131 – 1136.

[3] K. Polychronopoulou, C. Rebholz, M.A. Baker, L. Theodorou, N.G. Demas, S.J. Hinder, A.A. Polycarpou, C.C. Doumanidis, K. Bobel, Nanostructure, mechanical and tribological properties of reactive magnetron sputtered TiCx coatings, Diamond Relat. Mater. 17 (2008) 2054 – 2061.

[4] M.L.F. Parames, O. Conde, Growth of TiC films by thermal laser-assisted chemical vapour deposition, Appl. Surf. Sci. 109-110 (1997) 554 – 558.

[5] E. Kusano, A. Sato, N. Kikuchi, H. Nanto, A. Kinbara, Preparation of TiC films by alternate deposition of Ti and C layers using a dual magnetron sputtering source, Surf. Coat. Technol. 
120 – 121 (1999) 378 – 382.
[6] S. Inoue, Y. Wada, K. Koterazawa, Deposition of TiC films by dual source dc magnetron sputtering, Vacuum. 59 (2000) 735 – 741.

[7] H. Wang, S. Zhang, Y. Li, D. Sun, Bias effect on microstructure and mechanical properties of magnetron sputtered nanocrystalline titanium carbide thin films, Thin Sol. Film. 516 (2008) 
5419 – 5423.

[8] A.Z.A. Djafer, N. Saoula, N. Madaoui, A. Zerizer, Deposition and characterization of titanium carbide thin films by magnetron sputtering using Ti and TiC targets, Appl. Surf. Sci. 312 (2014) 57 – 62.

[9] I.Y. Konyashin, Thin TiCx films chemically vapour deposited onto cemented carbides from the TiCl4-CCl4-H2 mixture, Thin Sol. Film. 278 (1996) 37 – 44.

[10] L. Guzman, M. Bonelli, A. Miotello, D.C. Kothari, Process parameters optimization for TiN and TiC formation using reactive ion beam assisted deposition, Surf. Coat. Technol. 100 – 101 (1998) 500 – 502.

[11] F. Santerre, M.A.E. Khakani, M. Chaker, J.P. Dodelet, Properties of TiC thin films grown by pulsed laser deposition, Appl. Surf. Sci. 148 (1999) 24 – 33.

[12] Y. Suda, H. Kawasaki, K. Doi, J. Nanba, T. Ohshima, Preparation of crystalline TiC thin films grown by pulsed Nd:YAG laser deposition using Ti target in methane gas, Mater. Charact. 
48 (2002) 221 – 228.

[13] K.H.T. Raman, M.S.R.N. Kiran, U. Ramamurty, G.M. Rao, Structure and mechanical properties of Ti-C films deposited using combination of pulsed DC and normal DC magnetron co-sputtering, Appl. Surf. Sci. 258 (2012) 8629 – 8635.

[14] R.D. Arnell, P.J. Kelly, Recent advances in magnetron sputtering, Surf. Coat. Technol. 
112 (1999) 170 – 176.

[15] W.Y. Xin, W.L. Ping, X.Q. Ji, Influence of Ti target current on microstructure and properties of Ti-doped graphite-like carbon films, Trans. Nonferrous Met. Soc. China. 22 (2012) 1372 – 1380.

[16] Y. Cai, R.Y. Wang, H.D. Liu, C. Luo, Q. Wan, Y. Liu, H. Chen, Y.M. Chen, Q.S. Mei, B. Yang, Investigation of (Ti:N)-DLC coating prepared by ion source assisted cathodic arc ion-plating with varying Ti target currents, Diam. Relat. Mater. 69 (2016) 183 – 190.




How to Cite

Choeysuppaket, A. (2018). Effects of Ti target current on the crystal structure, morphology and chemical structure of TiC films as deposited by dual-target DC magnetron sputtering technique. Creative Science, 11(1), 11–17. Retrieved from https://ph01.tci-thaijo.org/index.php/snru_journal/article/view/156035