Effects of Ti target current on the crystal structure, morphology and chemical structure of TiC films as deposited by dual-target DC magnetron sputtering technique
Keywords:TiC films, Dual-target DC magnetron sputtering, Ti target current
TiC films were deposited on silicon wafers by dual-target DC magnetron sputtering technique. The effects of Ti target current on the crystal structure, surface morphology and chemical structure of the films were investigated using X-ray diffraction, field-emission scanning electron microscopy and Raman spectroscopy, respectively. The results showed that the TiC films were deposited with the Ti target current increasing from 400 – 600 mA, the surface roughness, grain size and thickness of films increased. As the Ti target current increased, the crystallinity of TiC films increased, the orientation of TiC crystal structure corresponded to (111) and (200) planes. In addition, the Raman spectra revealed that the increasing of Ti target current had also significantly influenced on chemical structure of TiC films.
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