Studies on Defect Detection and Thermal Influence in SiC Substrates Using an IR Thermal Imaging Camera
Main Article Content
Abstract
A long-wavelength infrared thermal imaging camera was applied to visually evaluate the thermal influence of defects in SiC substrates. Defects in substrates were rapidly and effectively detected by IR camera observation, and the dependence of the temperature on the defect size could be observed precisely. IR camera was applied to show clearly the change in heat propagation in areas of defects in SiC substrates by observation of temperature distribution images in real time. Consequently, the IR camera can be considered as an effective technique for evaluating the thermal influence of defects.
Article Details
The manuscript, information, content, picture and so forth which were published on Journal of Engineering, RMUTT has been a copyright of this journal only. There is not allow anyone or any organize to duplicate all content or some document for unethical publication.
References
H. Matsunami: Jpn. J. Appl. Phys. 43 (2004) 6835
V. Kumar, D. H. Kim, A. Basu and I. Adesida: IEEE Electron Device Lett. 29 (2008)18.
A. L. Corrion, C. Poblenz, F. Wu and J. S. Speck: J.Appl. Phys. 103 (2008) 093529.
C. Longeaud, J. P. Kleider, P. Kaminski, R. Kozlowski and M. Miczugaะ J. Phys.: Condens. Matter 21 (2009) 045801.
L. Ning, Z. Feng, Y. Wang, K. Zhang, Z. Feng and X. Xu: J. Mater. Sci. Technol. 25 (2009) 102.
P. Wutimakun, C. Buteprongjit and J. Morimoto:J. Cryst. Growth 311 (2009) 3781.
P. Wutimakun, H. Miyazaki, Y. Okamoto, J. Morimoto,T. Hayashi and H. Shiomi: Mater. Sci. Forum 600 (2009) 521.
L.Tajng, K. Toyoda, N. Nango and T. Ogawaะ J. Cryst.Growth 114 (1991) 64.
P. Wutimakun, T. Mori, H. Miyazaki, Y. Okamoto and J. Morimoto: Jpn. J. Appl. Phys. 47 (2008)5576.
X. Ma and T. Sudarshan: J. Electro. Mater. 33 (2004)450
P. Wutimakun and J. Morimoto: to be published in Jpn. J. Appl. Phys.
X, Ma, M. Dudley, W. Vetter and T. Sudarshan: Jpn.J. Appl. Phys. 42 (2003) L1077.
H. Yamaguchi and H. Matsuhataะ J. Electron. Mater.39 (2010) 715.
G. Fenga, J. Suda and T. Kimotoa: Physics B 404 (2009) 4745.
I.Montvay and E, Pietarinen: Physics Lett. B id (1982) 148.
K, L.e, H. Miyazaki, Y. Okamoto and J. Morimo@,Mater. Sci. Forum 645 (2010) 559.
K. Lee, H. Miyazaki, Y. Okamoto, J. Morimoto and K. Toda: to be published in Jpn. J. Appl. Phys.
R. Boukhanouf, A. Haddad, M. T. North and C. Buffone, Appl. Therm. Eng. 26 (2006) 2148.
B.G. Vainer, G.N. Kamaev and G.L. Kurishev, J.Cryst. Growth 210 (2000) 351.
J. Morikawa and T. Hashimoto, 15th Symposium on Thermophysical Properties, 2003, p. 578.
S. Wu, P. Geiser, J. Jun, J. Karpinski and R. Sobolewski: Phys. Rev. B 76 (2007) 085210.