Investigation of Physical and Mechanical Properties of Colored TiO2 Thin Films deposited by RF Magnetron Sputtering

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Busarin Noikaew
Laksana Wangmooklang
Siriporn Larpkiattaworn


The colored titanium dioxide (TiO2) thin films were prepared by RF magnetron sputtering technique using purity TiO2 target. In this study, the deposition time for sputtering process was varied from 60, 75, 90, 105 and 120 minutes by using the fixed appropriate sputtering power at 100 W. The working pressure of argon gas was kept constant at 6.0x10-1 Pa. As a consequence, TiO2 thin films were deposited on both glass and stainless steel substrates for color’s film observation. To study the physical and mechanical properties of colored TiO2 thin films, optical transmission, surface morphology and structure were investigated by using UV-Vis Spectrophotometer, FESEM and XRD, thin film thickness and adhesion were measured by calotester and micro scratch tester, respectively. It was found that the colored TiO2 thin films were clearly observed on both substrates. The optical transmission for TiO2 films showed highly transmission in the visible regions and surface morphologies showed nano-scale grain size and smooth surface. The structure of all TiO2 thin films exhibited amorphous structure.  For these results, thicknesses of colored TiO2 thin films are approximately 70 nm to 150 nm. In addition, the adhesion of colored films performed a good adhesion by increasing deposition time.


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